Chinese semiconductor equipment manufacturer Prinano has announced the successful delivery of its first self-developed PL-SR series inkjet step-and-repeat nanoimprint lithography system to a domestic specialty process client. According to Csmart, the system has passed inspection. It can accommodate nanoimprint processes with line widths below 10 nm, exceeding the 14 nm capability of Canon’s FPA-1200NZ2C nanoimprint lithography machine, which is claimed to produce 5 nm process chips. While this does not place the PL-SR in the same category as equipment for advanced logic chip manufacturing, it represents a notable performance milestone for Chinese-developed semiconductor tools.

Nanoimprint lithography avoids the complex EUV light sources required by conventional EUV systems, reducing energy use and equipment costs. However, the process is slower and not suited for complex logic chips, making it ideal for NAND Flash and similar memory devices with less intricate designs. ICsmart notes that Chinese memory makers could deploy Prinano’s technology to lessen reliance on imported high-end lithography systems and improve competitiveness against established memory leaders such as SK hynix and Samsung.

Canon’s FPA-1200NZ2C nanoimprint system remains subject to export restrictions to China, limiting access to foreign-supplied tools. Prinano’s PL-SR series, which features high-precision inkjet coating and alignment with uniform template joining from 20 mm × 20 mm to full 300 mm wafer scale, offers a domestic alternative. Its delivery signals a step toward breaking the monopoly of foreign suppliers in certain semiconductor manufacturing segments, potentially reshaping the competitive landscape in memory production.